Preliminary study on the characteristics of a rf-driven H sup minus source

Journal Article · Wed Apr 01 04:00:00 EST 1992 · Review of Scientific Instruments; (United States)

DOI:https://doi.org/10.1063/1.1142841· OSTI ID:7068506

McDonald, D S; Bachman, D A; DiVergilio, W F; Kunkel, W B; Leung, K N; Williams, M D ^[1]

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1. Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720 (United States)

The use of a rf-induction discharge as a H{sup {minus}} source is attractive for long life, pulsed, or cw operation. Recently, a new rf-driven, magnetically filtered multicusp source has been developed at LBL to generate volume-produced H{sup {minus}} beams with extracted current densities higher than 200 mA/cm{sup 2}. A total current of {similar to}40 mA can be obtained with a 5.6 mm diam aperture and a rf input power of 50 kW. The operating frequency is {similar to}2 MHz. As part of a study of the H{sup {minus}} production mechanism in rf plasmas, measurements of the electron energy distribution have been undertaken. Initial measurements were made with a modification of the standard Langmuir probe method. The probe characteristics were sampled at different phases of the rf cycle. Results show that the electron density does not vary significantly during the rf cycle. The dependence of electron density and temperature on source pressure and axial position has been investigated and the results are summarized.

• DOE Contract Number: AC03-76SF00098
• OSTI ID: 7068506
• Journal Information: Review of Scientific Instruments; (United States), Journal Name: Review of Scientific Instruments; (United States) Vol. 63:4; ISSN RSINA; ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
430301* -- Particle Accelerators-- Ion Sources
ANIONS
CHARGED PARTICLES
CUSPED GEOMETRIES
ELECTRIC PROBES
ELECTRON DENSITY
ELECTRON TEMPERATURE
FREQUENCY RANGE
HYDROGEN IONS
HYDROGEN IONS 1 MINUS
ION SOURCES
IONS
LANGMUIR PROBE
LAWRENCE LIVERMORE LABORATORY
MAGNETIC FIELD CONFIGURATIONS
MHZ RANGE
MHZ RANGE 01-100
NATIONAL ORGANIZATIONS
OPEN CONFIGURATIONS
PLASMA DIAGNOSTICS
PLASMA PRODUCTION
PROBES
RF SYSTEMS
US AEC
US DOE
US ERDA
US ORGANIZATIONS