Characterization of texture and microstructure of oriented PbTiO[sub 3] thin films grown by metalorganic chemical vapor deposition on Si(100)
- Department of Material Science and Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)
Oriented PbTiO[sub 3] (PT) thin films, approximately 2000 A thick, have been successfully grown on Si(100) using a low-pressure, cold-wall metalorganic chemical vapor deposition technique at temperatures as low as 450 [degree]C. Titanium isopropoxide, Ti(C[sub 3]H[sub 7]O)[sub 4], tetraethyl lead, Pb(C[sub 2]H[sub 5])[sub 4], and pure oxygen were used as precursor materials in this work. The dependence of film texture and microstructure on the Pb/Ti source flow ratio and growth temperature is described. With proper growth conditions, stoichiometric PbTiO[sub 3] films can be produced. Two types of polycrystalline PbTiO[sub 3] films, including multi-oriented and single-oriented textures, were obtained. At growth temperatures above the Curie point (cubic-to-tetragonal transition temperature), multi-oriented textures were found. On the other hand, oriented films were fabricated at growth temperatures in the range of 450--475 [degree]C. It is hypothesized that the preferred orientation is due to the combined effects of thermal stress and anisotropic growth rates along different crystal directions. Microstructure examinations using scanning electron microscopy showed visible grain boundaries for all crystalline samples, as well as the non-columnar cross-section morphology, which indicates highly dense and uniform structures. Using the transmission electron microscopy technique, these grains were found to consist of many fine crystalline particles (10--50 nm). Selected area electron diffraction patterns from these crystalline particles have been indexed in terms of the tetragonal PbTiO[sub 3] phase.
- DOE Contract Number:
- FG02-91ER45439
- OSTI ID:
- 7051539
- Journal Information:
- Journal of Applied Physics; (United States), Vol. 76:8; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
LEAD OXIDES
CHEMICAL VAPOR DEPOSITION
TITANIUM OXIDES
ANISOTROPY
ELECTRON MICROSCOPY
MICROSTRUCTURE
TEMPERATURE RANGE 0400-1000 K
TEXTURE
THIN FILMS
CHALCOGENIDES
CHEMICAL COATING
DEPOSITION
FILMS
LEAD COMPOUNDS
MICROSCOPY
OXIDES
OXYGEN COMPOUNDS
SURFACE COATING
TEMPERATURE RANGE
TITANIUM COMPOUNDS
TRANSITION ELEMENT COMPOUNDS
360202* - Ceramics
Cermets
& Refractories- Structure & Phase Studies