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Surface photovoltage and band bending at metal/GaAs interfaces: A contact potential difference and photoemission spectroscopy study

Conference · · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)
OSTI ID:7047688
; ; ;  [1];  [2]; ;  [3];  [4]; ;  [5]
  1. Princeton Univ., NJ (United States)
  2. Univ. de Provence, Marseille (France)
  3. Univ. of Wisconsin, Madison (United States)
  4. Inst. de Physique Appliquee, Lausanne (Switzerland)
  5. Bellcore, Red Bank, NJ (United States)
Contact potential difference (CPD) measurements using a Kelvin probe could with synchrotron radiation are used to investigate various aspects of the problem of surface photovoltage (SPV) induced by the synchrotron radiation at (110) and (100) GaAs surfaces. A large and quasipermanent SPV is found at surfaces of low doped and low temperature (110) samples. SPV discharge mechanisms are investigated. Finally, the CPD technique is used to define conditions which minimize SPV and allow accurate measurements of band bending at low temperature. Band bending measurements are reported for interfaces between metals and (110) and (100) GaAs surfaces.
OSTI ID:
7047688
Report Number(s):
CONF-910115--
Conference Information:
Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States) Journal Volume: 9:4
Country of Publication:
United States
Language:
English