Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Thin films of silicon on metallurgical silicon substrates: Phase II. Quarterly project report No. 2, December 1, 1977--28 February 1978

Technical Report ·
OSTI ID:7043654
The objectives of this study are to investigate thin films of silicon on metallurgical silicon substrates and to demonstrate an AM1 efficiency of 10 percent for large area (30 cm/sup 2/) thin film silicon solar cells by August 1979. Efforts during the past quarter have been directed to the purification of metallurgical silicon, the preparation of substrates, and the fabrication and characterization of solar cells. Iron and aluminum are major impurities in metallurgical silicon; the usefulness of the acid extraction technique and phosphorus pentoxide gettering technique for the removal of iron has been investigated in detail. Substrates for the deposition of the active region of solar cells have been prepared from metallurgical silicon purified by both techniques using the unidirectional solidification technique. Large area (30 cm/sup 2/) solar cells have been prepared from acid-leached planar substrates by the thermal reduction of trichlorosilane containing appropriate dopants. Chemically deposited tin-dioxide films were used as antireflection coatings. The best cell has an AM1 efficiency of 7.5 percent at room temperature. The characteristics of solar cells in the temperature range of -40 degrees C to 100 degrees C have been investigated. Preliminary work on the effects of grain boundaries by the EBIC technique has been carried out. The feasibility of using polycrystalline silicon films for the fabrication of MOS type solar cells has also been investigated.
Research Organization:
Southern Methodist Univ., Dallas, Tex. (USA)
OSTI ID:
7043654
Report Number(s):
SAN-1285-4
Country of Publication:
United States
Language:
English