skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces

Journal Article · · Review of Scientific Instruments; (United States)
DOI:https://doi.org/10.1063/1.1143279· OSTI ID:7037600
 [1]; ; ; ;  [2];  [3]
  1. Department of Physics, Utah State University, Logan, Utah 84322 (United States)
  2. Department of Physics and Astronomy, University of Missouri-Columbia, Columbia, Missouri 65211 (United States)
  3. School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907 (United States)

An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single-crystal surfaces using synchrotron x-ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and mount directly on a standard four-axis diffractometer and can also be used independently of the x-ray diffractometer. A low-current, pulse-counting, low-energy electron diffraction/Auger spectroscopy system with a position-sensitive detector enables {ital in} {ital situ} characterization of the film and substrate while the sample is located at the x-ray scattering position. A closed-cycle He refrigerator and electron bombardment heater provide controlled substrate temperatures from 30 to 1300 K. The chamber is also equipped with an ion sputter gun, a quadrupole mass spectrometer, and a gas handling system. Details of the design and operation of the instrument are described. To demonstrate the performance of the instrument, we present some preliminary results of a study of Xe physisorbed on the Ag(111) surface.

DOE Contract Number:
FG02-85ER45183
OSTI ID:
7037600
Journal Information:
Review of Scientific Instruments; (United States), Vol. 63:8; ISSN 0034-6748
Country of Publication:
United States
Language:
English