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U.S. Department of Energy
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Microcrystalline silicon growth for heterojunction solar cells. Final report, November 1982-January 1984

Technical Report ·
DOI:https://doi.org/10.2172/7035044· OSTI ID:7035044
Microcrystalline Si (m-Si) films with a 1.7eV energy bandgap and crystal size of several hundred A were e-beam evaporated on single crystalline Si (c-Si) to form a heterojunction with the substrate, or a window layer to a single crystalline p-n junction (heteroface structure). The goal was to enhance Voc by such uses of the larger bandgap m-Si, with the intriguing prospect of forming heterostructures with exact lattice match on each layer. It was found that the heterojunction structure was affected by interface and shunting problems and the best Voc achieved was only 482mV, well below that of single crystal Si homojunctions. The heteroface structure showed promise for some of the samples with p m-Si/p-n structure (the complementary structure did not show any improvement). Although several runs with different deposition conditions were run, the results were inconsistent. Any Voc enhancement obtained was too small to compensate for the current loss due to the extra absorption and poor carrier transport properties of the m-Si film. A study of the m-Si/c-Si interface using a p-p or n-n heterojunction showed that m-Si did not always serve as a minority carrier barrier as expected. The Voc in many samples was of opposite polarity from that predicted which indicated some degree of carrier collection. This raised problems concerning the nature of the m-Si/c-Si interface. In order for this approach to succeed, these interface problems need to be solved along with improvement of the m-Si layer quality.
Research Organization:
Applied Solar Energy Corp., City of Industry, CA (USA); Boston Coll., Chestnut Hill, MA (USA)
DOE Contract Number:
NAS-7-100-956369
OSTI ID:
7035044
Report Number(s):
DOE/JPL/956369-84/03; ON: DE84013757
Country of Publication:
United States
Language:
English