Synthesis of ultrafine particles by surface discharge-induced plasma chemical process (SPCP) and its application

Journal Article · Thu Oct 01 04:00:00 EDT 1992 · IEEE Transactions on Industry Applications (Institute of Electrical and Electronics Engineers); (United States)

DOI:https://doi.org/10.1109/28.158847· OSTI ID:7011654

Yamamoto, H ^[1]; Shioji, S ^[2]; Masuda, S ^[3]

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1. Dept. of Bioengineering, Soka Univ., Tokyo (Japan)
2. Dept. of Industrial Chemistry, Wakayama College of Technology, Wakayama (Japan)
3. Masuda Research Inc., Tokyo (Japan)

The surface discharge-induced plasma chemical process (SPCP) is a novel means of cold plasma processing that is possible under room temperature and pressure with a very large potential in various applications, including generation of gaseous ozone and ozonated water, generation of radicals for removal of SO[sub x], NO[sub x], HCl, and Hg vapor as well as other gaseous pollutants from combustion gases, treatment of plastic sheet and powder surfaces, etc. Although the plasma layer is very thin, its electron energy is large enough to produce chemical vapor deposition (CVD) reactions. If a CVD reactive gas mixture is in good contact with the surface plasma region, it is activated to form ultrafine particles, even under room temperature and atmospheric pressure. The authors named this method SPCP-CVD. In this work, comparison was made between the present SPCP-CVD and another type of cold plasma CVD using silent glow discharge (GPCP), which was already reported. In the GPCP-CVD system, two coaxial cylindrical electrodes are used in combination with two coaxial quartz tubes spaced at a small gap to generate silent discharge in the gap. In the SPCP-CVD system, a ceramic-made electrode assembly is used, where a high frequency and high voltage is applied to form an energetic and stable surface discharge.

• OSTI ID: 7011654
• Journal Information: IEEE Transactions on Industry Applications (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Transactions on Industry Applications (Institute of Electrical and Electronics Engineers); (United States) Vol. 28:5; ISSN ITIACR; ISSN 0093-9994
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400400 -- Electrochemistry
664400 -- Experimentally Derived Information on Atomic & Molecular Properties-- (1992-)
665300* -- Interactions Between Beams & Condensed Matter-- (1992-)
74 ATOMIC AND MOLECULAR PHYSICS
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CERAMICS
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COLD PLASMA
COMBUSTION PRODUCTS
DATA
DEPOSITION
DISPERSIONS
ELECTRIC DISCHARGES
ELECTROCHEMICAL COATING
ELECTRODES
ELECTROSTATICS
FABRICATION
FILMS
FLUIDS
GASES
GLOW DISCHARGES
HYPERFINE STRUCTURE
INFORMATION
MIXTURES
NUMERICAL DATA
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
OZONE
PLASMA
POLYMERS
SILICONES
SILOXANES
SINTERING
SUBSTRATES
SURFACE COATING
THIN FILMS
TITANIUM COMPOUNDS
TITANIUM OXIDES
TRANSITION ELEMENT COMPOUNDS