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Control of NO sub x by positive and negative pulsed corona discharges

Journal Article · · IEEE Transactions on Industry Applications (Institute of Electrical and Electronics Engineers); (USA)
DOI:https://doi.org/10.1109/28.54266· OSTI ID:6374479
 [1];  [2]
  1. Fukui Institute of Technology, No. 415, 3-2-1 Nishgahara, Kita-ku, Tokyo 114 (JP)
  2. Research Lab. of Electronics Equipment, Toshiba R and D Center, Toshiba-cho, Komukai, Saiwai-ku, Kawasaki 210 (JP)
The pulse-induced plasma chemical process (PPCP) is a novel means of processing with great potential in various applications including the removal of No, SO{sub 2}, HCl, and Hg vapor and other gaseous pollutants from combustion gases, the composition of new gaseous and solid substances, the production of ultrafine particulate materials, the treatment of surfaces, etc. Under normal pressures, the PPCP can raise the electron temperature for production of active chemical species, such as OH radical, O, O{sub 3}, O{minus}, O{sub 2}*, etc., without raising the ion temperature; this had been possible only by high-frequency glow discharge under low pressure. This paper reports on a reliable nanosecond-pulse high-voltage generator developed enabling continuous operation necessary to establish the PPCP as an industrial device.
OSTI ID:
6374479
Journal Information:
IEEE Transactions on Industry Applications (Institute of Electrical and Electronics Engineers); (USA), Journal Name: IEEE Transactions on Industry Applications (Institute of Electrical and Electronics Engineers); (USA) Vol. 26:2; ISSN 0093-9994; ISSN ITIAC
Country of Publication:
United States
Language:
English