Electronic structure of metal/GaAs(110) interfaces
Thesis/Dissertation
·
OSTI ID:7002349
The electronic structure of metal/GaAs(110) interfaces was investigated by the use of high-resolution synchrotron radiation core level photoemission. Thermochemical and electronegativity data pertaining to the possible compounds and solid solutions which can form in the interface region were used together with photoemission results to model the interfaces and establish general trends in metal/GaAs interface development. Results for Ce, Sm, Ti, V, Cr, Fe, Co, Cu, and Au overlayers on GaAs(110) are presented. The thermochemical information shows that the heats of formation and solution are generally greater for metal-As interface products than for metal-Ga interface products. The general trend identified for these metal/GaAs systems in that the Ga found in the interface region is in a solid solution of variable concentration. The solid solution tends toward increased concentration until a solution of Ga fully coordinated by overlayer atoms is reached. Quantitative fitting of the Ga core level spectra indicates that the Ga in solution in the interface regions has a chemical shift of -880, -850, -650, -650, -350, -150, 0, 100, and 500 meV for Ce, Sm, Ti, V, Cr, Fe, Co, Cu, and Au, respectively.
- Research Organization:
- Wisconsin Univ., Madison (USA)
- OSTI ID:
- 7002349
- Country of Publication:
- United States
- Language:
- English
Similar Records
Systematics of electronic structure and local bonding for metal/GaAs(110) interfaces
Photoemission study of the development of the Ti/GaAs(110) interface
Studies of silicon-refractory metal interfaces: photoemission study of interface formation and compound nucleation. Final report, 15 April 1983-30 September 1984
Journal Article
·
Wed Jul 01 00:00:00 EDT 1987
· J. Vac. Sci. Technol., A; (United States)
·
OSTI ID:6371420
Photoemission study of the development of the Ti/GaAs(110) interface
Journal Article
·
Fri Feb 14 23:00:00 EST 1986
· Phys. Rev. B: Condens. Matter; (United States)
·
OSTI ID:6144657
Studies of silicon-refractory metal interfaces: photoemission study of interface formation and compound nucleation. Final report, 15 April 1983-30 September 1984
Technical Report
·
Sun Oct 28 23:00:00 EST 1984
·
OSTI ID:5901551
Related Subjects
36 MATERIALS SCIENCE
360603 -- Materials-- Properties
42 ENGINEERING
420800* -- Engineering-- Electronic Circuits & Devices-- (-1989)
ARSENIC COMPOUNDS
ARSENIDES
CERIUM
CHROMIUM
COBALT
COPPER
ELECTRONIC STRUCTURE
ELEMENTS
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
GOLD
INTERFACES
IRON
METALS
PNICTIDES
RARE EARTHS
SAMARIUM
TITANIUM
TRANSITION ELEMENTS
VANADIUM
360603 -- Materials-- Properties
42 ENGINEERING
420800* -- Engineering-- Electronic Circuits & Devices-- (-1989)
ARSENIC COMPOUNDS
ARSENIDES
CERIUM
CHROMIUM
COBALT
COPPER
ELECTRONIC STRUCTURE
ELEMENTS
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
GOLD
INTERFACES
IRON
METALS
PNICTIDES
RARE EARTHS
SAMARIUM
TITANIUM
TRANSITION ELEMENTS
VANADIUM