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U.S. Department of Energy
Office of Scientific and Technical Information

Gallium arsenide for devices and integrated circuits

Book ·
OSTI ID:6998330

Gallium Arsenide has long been hailed as the material of the future and it is only in recent years that the technology associated with its growth and processing has matured to the point where IC production can be contemplated at the industrial level. This point has now been reached and the electronics industries in Europe, the USA and Japan are actively moving from research activities into product development using this and related material. The text is divided into 15 chapters: Gallium Arsenide: Physical and Transport Properties; Liquid phase and Vapour Phase Epitaxy of GaAs and Related Compounds; Expitaxial Growth and GaAs: MBE and MOCVD; Characterization of GaAs I: Electrical Techniques; Characterization of GaAsII: Ion Beam Analysis; Ion Implantation; Wet and Dry Processing GaAs; Microwave and Millimetre - Wave Diodes; GaAs Mesfet's and High Electron Mobility Transistors (HEMT); Optoelectronic Devices and Components; Gallium Arsenide Monolithic Microwave Integrated Circuits; GaAs Digital Integrated Circuits; III-V Semiconductors for Solar Cells.

OSTI ID:
6998330
Country of Publication:
United States
Language:
English