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Effect of ion implantation on the corrosion behavior of lead and a lead-antimony alloy

Journal Article · · Journal of the Electrochemical Society; (United States)
DOI:https://doi.org/10.1149/1.2059169· OSTI ID:6998263
; ;  [1]
  1. Lawrence Berkeley Lab., CA (United States). Materials Science Division
Ion implantation of different metals in Pb and Pb-4% Sb has been found to improve the open-circuit corrosion resistance of the two metals in 5M H[sub 2]SO[sub 4]. Titanium ions were implanted under different conditions of ion dose and ion energy. Optimum implantation conditions resulted in an up to 72-fold reduction of corrosion currents. The implantation of V, Cr, Ni, and W has been investigated for one implantation condition and has also resulted in decreased corrosion currents. The corrosion behavior was characterized by the current response to small anodic potential steps. Surface analysis and depth profiles have shown the importance of the spatial distribution of the implanted ions for their effects on the anodic and cathodic parts of the corrosion reactions.
DOE Contract Number:
AC03-76SF00098
OSTI ID:
6998263
Journal Information:
Journal of the Electrochemical Society; (United States), Journal Name: Journal of the Electrochemical Society; (United States) Vol. 141:10; ISSN JESOAN; ISSN 0013-4651
Country of Publication:
United States
Language:
English