Corrosion characteristics of TiN prepared by plasma source ion implantation
Conference
·
OSTI ID:346845
- Himeji Inst. of Tech., Hyogo (Japan)
- Kobe City Coll. of Technology, Hyogo (Japan)
The injection of nitrogen ions to a pure titanium has been performed by plasma source ion implantation with a negative voltage of 10 kV, a pulse width of 10 {micro}s, and a repetition rate of 100 Hz. The ESCA/AES analysis of nitrogen-ion implanted samples shows the deposition of nitrogen ions with a Gaussian distribution and the formation of TiN in the surface layer. Corrosion characteristics were examined by anodic polarization curves. Corrosion current of the implanted samples was decreased one order of magnitude less than that of the unimplanted sample, indicating a remarkable enhancement of the corrosion resistance of the ion implanted titanium. The enhancement of corrosion resistance was observed at the ion doping concentration over one-tenth of the atomic density of titanium. However, for a doping concentration above the atomic density of titanium, the improvement of corrosion resistance was slightly reduced.
- OSTI ID:
- 346845
- Report Number(s):
- CONF-980601--
- Country of Publication:
- United States
- Language:
- English
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