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Generation of an intense metal-ion beam by a pulsed ion diode

Conference · · Review of Scientific Instruments; (USA)
OSTI ID:6996957
;  [1]
  1. Department of Electrical Engineering, Faculty of Engineering, Osaka City University, Osaka 558, Japan (JP)

Intense pulsed metal-ion beams ({similar to}100 keV, {similar to}1 kA, 0.5 {mu}s, Pb and Cu) were generated by a pulsed magnetically insulated ion diode driven by a long-pulse Marx generator. The ion current density exceeded the Child--Langmuir value by a factor of 50. The ion beams were extracted from either an anode plasma produced by electron bombardment on a metal anode or by a vacuum-arc metal-plasma source. Metal-ion beams rich in high-energy multi-ionized ions and also impurity ions of H{sup +}, C{sup +}, and O{sup +} were measured by a Thomson-parabola ion spectrometer and a magnetic mass analyzer. The amount of impurity ions were reduced by conditioning of the anode surface. A design was considered to develop an intense metal-ion source with a total ion current of 1 kA, an ion energy of 100--200 keV, a pulse width of 10 {mu}s, and repetition rate of 10 Hz, all of which correspond to a 100 mA steady-state metal-ion beam.

OSTI ID:
6996957
Report Number(s):
CONF-890703--
Journal Information:
Review of Scientific Instruments; (USA), Journal Name: Review of Scientific Instruments; (USA) Vol. 61:1; ISSN RSINA; ISSN 0034-6748
Country of Publication:
United States
Language:
English