Diagnosis of high-intensity pulsed heavy ion beam generated by a novel magnetically insulated diode with gas puff plasma gun

Journal Article · Wed Oct 15 04:00:00 EDT 2008 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.2999904· OSTI ID:21266449

Ito, H; Miyake, H; Masugata, K ^[1]

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1. Department of Electrical and Electronic Engineering, University of Toyama, 3190 Gofuku, Toyama 930-8555 (Japan)

Intense pulsed heavy ion beam is expected to be applied to materials processing including surface modification and ion implantation. For those applications, it is very important to generate high-purity ion beams with various ion species. For this purpose, we have developed a new type of a magnetically insulated ion diode with an active ion source of a gas puff plasma gun. When the ion diode was operated at a diode voltage of about 190 kV, a diode current of about 15 kA, and a pulse duration of about 100 ns, the ion beam with an ion current density of 54 A/cm{sup 2} was obtained at 50 mm downstream from the anode. By evaluating the ion species and the energy spectrum of the ion beam via a Thomson parabola spectrometer, it was confirmed that the ion beam consists of nitrogen ions (N{sup +} and N{sup 2+}) of energy of 100-400 keV and the proton impurities of energy of 90-200 keV. The purity of the beam was evaluated to be 94%. The high-purity pulsed nitrogen ion beam was successfully obtained by the developed ion diode system.

• OSTI ID: 21266449
• Journal Information: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 10 Vol. 79; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
ANODES
CURRENT DENSITY
CURRENTS
DIAGNOSIS
ELECTRIC POTENTIAL
ENERGY SPECTRA
HEAVY IONS
IMPURITIES
ION BEAMS
ION IMPLANTATION
ION SOURCES
KEV RANGE
NITROGEN
NITROGEN IONS
PARABOLAS
PLASMA DIAGNOSTICS
PLASMA GUNS
PROTONS
SPECTROMETERS