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Residual [alpha]-Si[sub 3]N[sub 4] in O[prime] crystals in CeO[sub 2]-doped O[prime] + [beta][prime] SiAlON ceramics

Journal Article · · Journal of the American Ceramic Society; (United States)
; ; ;  [1]
  1. Univ. of Illinois, Urbana, IL (United States)
The microstructure of a pressureless sintered (1,605 C, 90 min) O[prime] + [beta][prime] SiAlON ceramic with CeO[sub 2] doping has been investigated. It is duplex in nature, consisting of very large, slablike elongated O[prime] grains (20--30 [mu]m long), and a continuous matrix of small rodlike [beta][prime] grains (< 1.0 [mu]m in length). Many [alpha]-Si[sub 3]N[sub 4] inclusions (0.1--0.5 [mu]m in size) were found in the large O[prime] grains. CeO[sub 2]-doping and its high doping level as well as the high Al[sub 2]O[sub 3] concentration were thought to be the main reasons for accelerating the reaction between the [alpha]-Si[sub 3]N[sub 4] and the Si-Al-O-N liquid to precipitate O[prime]-SiAlON. This caused the supergrowth of O[prime] grains. The rapid growth of O[prime] crystals isolated the remnant [alpha]-Si[sub 3]N[sub 4] from the reacting liquid, resulting in a delay in the [alpha] [yields] [beta]-Si[sub 3]N[sub 4] transformation. The large O[prime] grains and the [alpha]-Si[sub 3]N[sub 4] inclusions have a pronounced effect on the strength degradation of O[prime] + [beta][prime] ceramics.
DOE Contract Number:
FG02-91ER45439
OSTI ID:
6988672
Journal Information:
Journal of the American Ceramic Society; (United States), Journal Name: Journal of the American Ceramic Society; (United States) Vol. 77:8; ISSN 0002-7820; ISSN JACTAW
Country of Publication:
United States
Language:
English