Thickness determination of metal thin films with spectroscopic ellipsometry for x-ray mirror and multilayer applications
- Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
Sputtered thin film and multilayer x-ray mirrors are made at the Advanced Photon Source (APS) deposition lab for the APS users. Film thickness calibrations are carried out using {ital in situ} and {ital ex situ} spectroscopic ellipsometry, interferometry, and x-ray reflectometry. Here, we present a systematic study of thickness and optical constant determination of sputtered thin films of Au, Pt, Pd, Rh, Cr, Cu, as well as W and C, using {ital in situ} ellipsometry. Multiple data sets were obtained for each film material with incremental thicknesses and were analyzed with their correlation in mind. Results are compared with those obtained from interferometry and x-ray reflectivity measurements. The applications and limitations of spectroscopic ellipsometry for metal thin films are discussed. Observations of a relaxation effect of a Rh/Si film and a difference in growth mode in the Cr/Si system compared with other metal/Si systems are presented. {copyright} {ital 1999 American Vacuum Society.}
- OSTI ID:
- 698864
- Journal Information:
- Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 5 Vol. 17; ISSN 0734-2101; ISSN JVTAD6
- Country of Publication:
- United States
- Language:
- English
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