Thickness determination of metal thin films with spectroscopic ellipsometry for x-ray mirror and multilayer applications. [Au; Pt; Pd; Cr; W; Cu]
- Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
Sputtered thin film and multilayer x-ray mirrors are made at the Advanced Photon Source (APS) deposition lab for the APS users. Film thickness calibrations are carried out using [ital in situ] and [ital ex situ] spectroscopic ellipsometry, interferometry, and x-ray reflectometry. Here, we present a systematic study of thickness and optical constant determination of sputtered thin films of Au, Pt, Pd, Rh, Cr, Cu, as well as W and C, using [ital in situ] ellipsometry. Multiple data sets were obtained for each film material with incremental thicknesses and were analyzed with their correlation in mind. Results are compared with those obtained from interferometry and x-ray reflectivity measurements. The applications and limitations of spectroscopic ellipsometry for metal thin films are discussed. Observations of a relaxation effect of a Rh/Si film and a difference in growth mode in the Cr/Si system compared with other metal/Si systems are presented. [copyright] [ital 1999 American Vacuum Society.]
- OSTI ID:
- 6115435
- Journal Information:
- Journal of Vacuum Science and Technology, A, Vol. 17:5; ISSN 0734-2101
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ADVANCED PHOTON SOURCE
CARBON
CHROMIUM
COPPER
ELLIPSOMETRY
GOLD
MIRRORS
PALLADIUM
PLATINUM
RHODIUM
SILICON
THICKNESS
THIN FILMS
TUNGSTEN
X-RAY EQUIPMENT
DIMENSIONS
ELEMENTS
EQUIPMENT
FILMS
MEASURING METHODS
METALS
NONMETALS
PLATINUM METALS
RADIATION SOURCES
SEMIMETALS
SYNCHROTRON RADIATION SOURCES
TRANSITION ELEMENTS
360104* - Metals & Alloys- Physical Properties
665100 - Nuclear Techniques in Condensed Matter Physics - (1992-)