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Fabrication of Tl-Ba-Ca-Cu-O films by annealing rf-sputtered Ba-Ca-Cu-O films in thallium oxide vapors

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.103316· OSTI ID:6986138
; ; ;  [1]
  1. Central Research and Development Department, Experimental Station, E. I. du Pont de Nemours and Company, P.O. Box 80356, Wilmington, Delaware 19880-0356 (USA)

Thin, superconducting Tl-Ba-Ca-Cu-O films were grown using a two-step fabrication process which involved the growth of Ba-Ca-Cu-O films by reactive magnetron sputtering followed by {ital ex} {ital situ} high-temperature crystallization and thallination under thallium oxide vapors. Films were thallinated with both Tl{sub 2}O{sub 3} and Tl{sub 2}Ba{sub 2}CuO{sub 6} as the source for thallium oxide vapors. Highly oriented films were obtained with the {ital c} axis perpendicular to the surface of the film. Best films had a {ital T}{sub {ital c}} ({ital R}=0) of 104 K and a critical current density of 5{times}10{sup 4} A/cm{sup 2} at 77 K.

OSTI ID:
6986138
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 56:8; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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