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U.S. Department of Energy
Office of Scientific and Technical Information

Process research of non-CZ silicon material. Quarterly report No. 2, January 1, 1984-March 31, 1984

Technical Report ·
DOI:https://doi.org/10.2172/6980878· OSTI ID:6980878
In this program, which started November 4, 1983, the fabrication of solar cells on N-base material using simultaneous diffusion of liquid boron and phosphorus dopants to from the desired P/sup +/NN/sup +/ cell structure is being studied. This simultaneous junction formation method is being compared to the sequential junction formation method where phosphorus is diffused to form an N/sup +/N back surface field followed by a boron diffusion for the P/sup +/N front junction. During the contract, the sensitivity of the process parameters will also be studied; and a cost analysis of the new junction formation process will be performed using SAMICS-IPEG methodology.
Research Organization:
Westinghouse Electric Corp., Pittsburgh, PA (USA). Advanced Energy Systems Div.
DOE Contract Number:
NAS-7-100-956616
OSTI ID:
6980878
Report Number(s):
DOE/JPL/956616-83/2; WAESD-TR-84-0013; ON: DE84011548
Country of Publication:
United States
Language:
English