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Moving species during ion mixing in Ge sub x Si sub 1 minus x /metal systems

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.345608· OSTI ID:6975763
; ; ;  [1];  [2]
  1. Department of Electrical Computer Engineering, University of California, San Diego, La Jolla, California 92093-0407 (US)
  2. Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 (USA)
The origin of the motion of semiconductors during ion mixing was investigated by studying both the temperature and the atomic mass dependence of moving species in the Ge{sub {ital x}}Si{sub 1{minus}{ital x}}/Ni and the Ge{sub {ital x}}Si{sub 1{minus}{ital x}}/Pd systems. Ion mixing was performed with 280-keV Ar ions at temperatures between 30 K and room temperature. The atomic mass of the Ge{sub {ital x}}Si{sub 1{minus}{ital x}} alloy was adjusted by changing the concentration of Ge in the alloy. In thermally induced reactions, no preferential motion of Si or Ge was observed. During ion mixing, the atomic flux of Si was observed to be enhanced compared to that of Ge. The atomic flux of the sum of Si and Ge to metal decreases with increasing substrate temperature during mixing and with increasing Ge concentration in the Ge{sub {ital x}}Si{sub 1{minus}{ital x}} alloy. From the strong atomic mass dependence of the moving species during ion mixing it is concluded that the origin of the motion of semiconductors under ion mixing conditions is due to the effects of secondary recoils.
DOE Contract Number:
FG03-84ER45156
OSTI ID:
6975763
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:4; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English