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Mechanism of silicon film deposition in the RF plasma reduction of silicon tetrachloride

Journal Article · · Plasma Chem. Plasma Process.; (United States)
DOI:https://doi.org/10.1007/BF00571271· OSTI ID:6972782
; ; ;
Plasma-chemical reduction of SiCl/sub 4/ in mixtures with H/sub 2/ and Ar has been studied by optical emission spectroscopy (OES) and laser interferometry techniques. It has been found that the Ar:H/sub 2/ ratio strongly affects the plasma composition as well as the deposition (r /SUB D/ ) and etch (r /SUB E/ ) rates of Si:H, Cl films and that the electron impact dissociation is the most important channel for the production of SiCl /SUB x/ species, which are the precursors of the film growth. Chemisorption of SiCl /SUB x/ and the reactive surface reaction SiCl /SUB x/ + H ..-->.. -SiCl /SUB x-1/ + HCl are important steps in the deposition process. The suggested deposition model gives r /SUB d/ ..cap alpha.. (SiCl /SUB x/ )(H), in agreement with the experimental data. Etching of Si:H, Cl films occurs at high Ar:H/sub 2/ ratio when Cl atoms in the gas phase become appreciable and increases with increasing Cl concentration. The etch rate is controlled by the Cl atom chemisorption step.
Research Organization:
Univ. di Bari, Bari
OSTI ID:
6972782
Journal Information:
Plasma Chem. Plasma Process.; (United States), Journal Name: Plasma Chem. Plasma Process.; (United States) Vol. 6:2; ISSN PCPPD
Country of Publication:
United States
Language:
English

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Related Subjects

14 SOLAR ENERGY
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
ARGON
CHEMICAL REACTION KINETICS
CHEMICAL REACTIONS
CHEMISORPTION
CHLORIDES
CHLORINE
CHLORINE COMPOUNDS
COLLISIONS
DEPOSITION
DIRECT ENERGY CONVERTERS
DISSOCIATION
ELECTRON COLLISIONS
ELECTRON-MOLECULE COLLISIONS
ELEMENTS
EMISSION SPECTROSCOPY
EQUIPMENT
FABRICATION
FLUIDS
GASES
HALIDES
HALOGEN COMPOUNDS
HALOGENS
HYDROGEN
INTERFEROMETRY
KINETICS
MOLECULE COLLISIONS
NONMETALS
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
PLASMA ARC SPRAYING
QUANTITY RATIO
RARE GASES
REACTION KINETICS
SEMIMETALS
SEPARATION PROCESSES
SILICON
SILICON CHLORIDES
SILICON COMPOUNDS
SILICON SOLAR CELLS
SOLAR CELLS
SOLAR EQUIPMENT
SORPTION
SPECTROSCOPY
SPRAY COATING
SURFACE COATING