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Relationship between IBICC imaging and SEU in CMOS ICs

Conference · · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)
DOI:https://doi.org/10.1109/23.273478· OSTI ID:6953145
; ;  [1]; ; ; ;  [2]
  1. Sandia National Lab., Albuquerque, NM (United States)
  2. Univ. of Melbourne, Parkville, Victoria (Australia). Micro Analytical Research Centre

Ion-beam-induced charge-collection imaging (IBICC) has been used to study the SEU mechanisms of the Sandia TA670 16K-bit SRAM. Quantitative charge-collection spectra from known regions of the memory cell have been derived with this technique. For 2.4-MeV He ions at normal incidence, charge collection depth for a reverse-biased p+ drain strike is estimated to be 4.8[+-]0.4 [mu]m. Heavy-ion strikes to the reverse-biased p-well result in nearly complete collection of deposited charge to a depth of 5.5[+-]0.5 [mu]m. A charge amplification effect in the n-on drain is identified and is due to either bipolar amplification or a shunt effect in the parasitic vertical npn bipolar transistor associated with the n+/n substrate, p-well, and n+ drain. This effect is present only when the n+ drain is at 0V bias. When coupled with previous SEU-imaging, these results strongly suggest that the dominant SEU mechanism in this SRAM is a heavy-ion strike to the n-on transistor drain.

DOE Contract Number:
AC04-76DP00789
OSTI ID:
6953145
Report Number(s):
CONF-930704--
Journal Information:
IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) Vol. 40:6Pt1; ISSN 0018-9499; ISSN IETNAE
Country of Publication:
United States
Language:
English