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Title: Electron beam induced current and cathodoluminescence imaging of the antiphase domain boundaries in GaAs grown on Si

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.102790· OSTI ID:6952327
;  [1];  [2]
  1. Hewlett-Packard Company, Palo Alto, California 94304 (USA)
  2. Materials and Chemical Sciences Division, Center for Advanced Materials, Lawrence Berkeley Laboratory, Berkeley, California 94720 (USA)

Electrical and optical properties of antiphase domain boundaries (APBs) in GaAs epitaxial layers grown on Si substrates have been investigated using cathodoluminescence, electron beam induced current, and scanning deep level transient spectroscopy. It was found that APBs reduce near-band-gap luminescence and minority-carrier lifetime. In contrast to recombination at threading dislocations in GaAs films, the nonradiative recombination processes at APBs are not due to deep traps but rather to a continuum of band-gap states introduced by APBs.

DOE Contract Number:
AC03-76SF00098
OSTI ID:
6952327
Journal Information:
Applied Physics Letters; (USA), Vol. 56:4; ISSN 0003-6951
Country of Publication:
United States
Language:
English