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The free-radical and ion chemistry of volatile silanes, germanes and phosphines: Informal technical report, August 1, 1985-October 31, 1986

Technical Report ·
OSTI ID:6952152

This report is divided into 2 main sections: photochemical studies and ion-molecule reactions. The discussions listed under photochemical studies are: infrared laser photochemistry of SiH/sub 4/-CH/sub 3/Cl mixtures; infrared laser photochemistry of SiH/sub 4/-NO mixtures; infrared laser photochemistry of SiH/sub 4/-D/sub 2/ mixtures; the reaction of GeH/sub 3/ radicals with NO; and the infrared laser photochemistry of silane. Under ion-molecule reactions, the reactions of Si/sup +/ ions with methylsilane and ethane are discussed. 9 refs. (PLG)

Research Organization:
Pennsylvania State Univ., University Park (USA). Dept. of Chemistry
DOE Contract Number:
AC02-76ER03416
OSTI ID:
6952152
Report Number(s):
DOE/ER/03416-T3; ON: DE87003144
Country of Publication:
United States
Language:
English