Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

The free-radical and ion chemistry of volatile silanes, germanes and phosphines: Annual informal technical report, November 1, 1986-May 31, 1987

Technical Report ·
OSTI ID:6356747

The following were studied: infrared laser photochemistry of SiH/sub 4/-D/sub 2/ mixtures; insertion of SiH/sub 2/ into GeH/sub 4/; infrared laser photochemistry of CH/sub 3/SiH/sub 3/-HCl mixtures; reaction of GeH/sub 3/ radicals with NO; and reactions of Si/sup +/ ions with methylsilane and ethane. (DLC)

Research Organization:
Pennsylvania State Univ., University Park (USA). Dept. of Chemistry
DOE Contract Number:
AC02-76ER03416
OSTI ID:
6356747
Report Number(s):
DOE/ER/03416-48; ON: DE87011926
Country of Publication:
United States
Language:
English