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Superconducting Bi-Sr-Ca-Cu-O films by sputtering using a single oxide target

Conference · · AIP Conference Proceedings (American Institute of Physics); (USA)
OSTI ID:6948885
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  1. AT T Bell Laboratories, Murray Hill, NJ 07974 (USA)

We have prepared superconducting thin films of Bi-Sr-Ca-Cu-O with T{sub c} (R=0) at 82 K and a 20% sharp drop in resistivity around 115 K by RF magnetron sputtering using a single oxide target. The nominal target composition is (metal cations) 2:1.56:1.09:1.86 of Bi:Sr:Ca:Cu. The as-deposited films have a compositional ratio of Bi{sub 2}Sr{sub 1.9}Ca{sub 1.3}Cu{sub 2.6}O{sub x} ({plus minus}5%) as determined by Rutherford backscattering spectrometry (RBS). The substrates used here are single-crystal SrTiO{sub 3}(100) and MgO(100). With heat treatments at temperatures above 860 {degree}C, we have obtained superconducting films with an almost single-phase Bi{sub 2}Sr{sub 2}Ca{sub 1}Cu{sub 2}O{sub 8} as revealed by both X-ray diffraction and transmission electron microscopy (TEM). The films are highly textured with the c-axis perpendicular to the film plane. The room-temperature resistivity of the films is low around 100--200 {mu}{Omega}-cm. High critical current densities, in zero magnetic field, are of 10{sup 5} A/cm{sup 2} measured by the transport method at temperatures 10 K below T{sub c} (R=0). The superconducting properties such as T{sub c}'s and J{sub c}'s are independent of the film thickness in the range between 0.07 to 0.2 {mu}m.

OSTI ID:
6948885
Report Number(s):
CONF-881035--
Journal Information:
AIP Conference Proceedings (American Institute of Physics); (USA), Journal Name: AIP Conference Proceedings (American Institute of Physics); (USA) Vol. 182:1; ISSN 0094-243X; ISSN APCPC
Country of Publication:
United States
Language:
English