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Porous silicon oxynitrides formed by ammonia heat treatment

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.346077· OSTI ID:6944697
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  1. Sandia National Laboratories, Albuquerque, New Mexico 87185 (USA)

Porous silicon and its oxide can be converted into porous silicon oxynitrides by ammonia heat treatment. For example, ammonia treatment at 1000 {degree}C for 1 h following 850 {degree}C, 30-min steam oxidation of porous silicon can result in up to 40 at. % nitrogen in the porous oxynitrides. These porous silicon oxynitrides are compositionally more uniform than ammonia-nitrided thermal oxides which exhibit nitrogen buildup at the oxide layer interfaces. However, the order of the oxidation and nitridation treatment matters: nitrided oxidized porous silicon exhibits higher electrical breakdown strength than nitrided porous silicon or oxidized nitrided porous silicon.

DOE Contract Number:
AC04-76DP00789
OSTI ID:
6944697
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:8; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English