Application of the Child-Langmuir law to magnetron discharge plasmas

Journal Article · Mon Aug 01 04:00:00 EDT 1994 · IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States)

DOI:https://doi.org/10.1109/27.310653· OSTI ID:6935893

Kuwahara, Kiyoshi; Fujiyama, Hiroshi ^[1]

---

1. Nagasaki Univ. (Japan). Dept. of Electrical Engineering and Computer Science

In order to investigate the influence of magnetic field on magnetron plasmas, the dependence of discharge-current density (J[sub d]) on magnetic flux densities (B) perpendicular to the electric field over the whole discharge space in a magnetron apparatus with flat multi-targets has been studies. The dependencies on working gas pressures (P) and voltages (V) have been also studies in the configuration. From the experimental results, it was found that J[sub d] was approximately proportional to B[sup 2], P[sup 2] and V[sup 3/2]. The sheath structure in the apparatus has been investigated as a function of B by both a probe method and a spectroscopic one. The cathode-fall thickness was roughly proportional to B[sup [minus]1]. From a numerical analysis on kinetics of [gamma] electrons emitted from the cathode surface, it was found that the dependence of J[sub d] on B could be explained by the Child-Langmuir law, in which the sheath thickness was replaced by the equivalent electron Larmor radius.

• OSTI ID: 6935893
• Journal Information: IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States) Vol. 22:4; ISSN ITPSBD; ISSN 0093-3813
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
360201 -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360601 -- Other Materials-- Preparation & Manufacture
DEPOSITION
ELECTRIC DISCHARGES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
EQUIPMENT
MAGNETRONS
MATERIALS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
PHYSICAL VAPOR DEPOSITION
PLASMA DIAGNOSTICS
PLASMA PRODUCTION
SURFACE COATING