Measurement of atomic indium during metalorganic chemical vapor deposition

Journal Article · Wed Jan 31 23:00:00 EST 1990 · Journal of Applied Physics; (USA)

DOI:https://doi.org/10.1063/1.345644· OSTI ID:6935080

Hebner, G A; Killeen, K P ^[1]

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1. Sandia National Laboratories, P.O. Box 5800, Albuquerque, New Mexico 87185 (US)

Atomic indium, produced by the pyrolysis of trimethylindium (TMIn) during metalorganic chemical vapor deposition, has been directly observed using resonant fluorescence spectroscopy. The indium fluorescence signal is linear with TMIn flow rate at a susceptor temperature of 500 {degree}C above a small background threshold level. The threshold for the observation of an indium signal is 325 {degree}C. Addition of trimethylantimony (TMSb) at concentrations less than those required for normal InSb epitaxial growth results in quenching of the indium signal.

• OSTI ID: 6935080
• Journal Information: Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:3; ISSN 0021-8979; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

640302* -- Atomic
Molecular & Chemical Physics-- Atomic & Molecular Properties & Theory
74 ATOMIC AND MOLECULAR PHYSICS
ALKYL RADICALS
ANTIMONIDES
ANTIMONY COMPOUNDS
ATOMS
CHEMICAL COATING
CHEMICAL REACTIONS
CHEMICAL VAPOR DEPOSITION
DECOMPOSITION
DEPOSITION
ELEMENTS
EPITAXY
FLUORESCENCE
INDIUM
INDIUM ANTIMONIDES
INDIUM COMPOUNDS
LUMINESCENCE
METALS
METHYL RADICALS
PNICTIDES
PYROLYSIS
RADICALS
RESONANCE
SPECTROSCOPY
SURFACE COATING
THERMOCHEMICAL PROCESSES