Laser conditioning of optical thin films

Conference · Mon May 08 04:00:00 EDT 1989

DOI:https://doi.org/10.1117/12.2294445· OSTI ID:6935052

Wolfe, C R; Kozlowski, M R; Campbell, J H; Rainer, F; Morgan, A J; Gonzales, R P

Results are presented that show the damage thresholds of e-beam deposited multi-layer HfO{sub 2}/SiO{sub 2} thin films can be permanently increased by a factor of 2 to 3 by illumination with subthreshold fluences of laser light. This subthreshold illumination procedure is referred to as laser conditioning.'' The films used in this study were prepared by three different physical-vapor-deposition techniques: ion-beam sputtering, plasma plating and e-beam evaporation. Only the e-beam deposited films showed consistent and significant improvement with laser conditioning. Of the material pairs examined (HfO{sub 2}/SiO{sub 2}, ZrO{sub 2}/SiO{sub 2} and TiO{sub 2}/SiO{sub 2}), HfO{sub 2}/SiO{sub 2} gave the greatest and most consistent damage improvement with conditioning. The number of layers and the reflective or transmissive characteristics of the HfO{sub 2}/SiO{sub 2} films were found to have little impact on laser conditioning of the film. The results show that the damage thresholds of a wide range of e-beam deposited coatings (e.g. HR's, polarizers, etc.) can be improved by laser conditioning. Several possible conditioning mechanisms are examined. 40 refs., 10 figs.

• Research Organization: Lawrence Livermore National Lab., CA (USA)
• Sponsoring Organization: DOE/DP
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 6935052
• Report Number(s): UCRL-101641; CONF-8911192--3; ON: DE90013483
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360206 -- Ceramics
Cermets
& Refractories-- Radiation Effects
656002 -- Condensed Matter Physics-- General Techniques in Condensed Matter-- (1987-)
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700208* -- Fusion Power Plant Technology-- Inertial Confinement Technology
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
BEAMS
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COATINGS
CONFINEMENT
DAMAGE
DEPOSITION
ELECTROMAGNETIC RADIATION
ELECTRON BEAMS
ENERGY BEAM DEPOSITION FILMS
FILMS
HAFNIUM COMPOUNDS
HAFNIUM OXIDES
HARDENING
INERTIAL CONFINEMENT
LASER RADIATION
LEPTON BEAMS
OXIDES
OXYGEN COMPOUNDS
PARTICLE BEAMS
PHYSICAL RADIATION EFFECTS
PLASMA CONFINEMENT
RADIATION EFFECTS
RADIATION HARDENING
RADIATIONS
REFRACTORY METAL COMPOUNDS
SILICON COMPOUNDS
SILICON OXIDES
SPUTTERING
SURFACE COATING
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
VAPOR DEPOSITED COATINGS