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Investigation of optical damage mechanisms in hafnia and silica thin films using pairs of subnanosecond laser pulses with variable time delay

Journal Article · · Journal of Applied Physics; (United States)
DOI:https://doi.org/10.1063/1.351288· OSTI ID:5129912
; ;  [1]
  1. University of California, Lawrence Livermore National Laboratory, Livermore, California 94550 (United States)
Optical damage thresholds of submicron-thick, electron beam deposited HfO{sub 2} and SiO{sub 2} films on BK-7 substrates have been measured by monitoring the emission of neutral constituents during excitation with time-delayed pairs of 70-ps laser pulses at a wavelength of 1064 nm. The dependence of the optical damage threshold on time delay provides evidence of the optical damage mechanism. For SiO{sub 2}, linear absorption is the mechanism for energy deposition into the films by the laser beams. The data for HfO{sub 2} are less definitive, although linear absorption is the most likely damage mechanism. The behavior of the single-layer films is compared to multilayer HfO{sub 2}-SiO{sub 2} high-reflector coatings, for which a conditioning'' effect causes an increased optical damage threshold due to multiple pulse laser excitation at fluences below the single-pulse optical damage threshold.
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
5129912
Journal Information:
Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 71:3; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English