The role of film interfaces in near-ultraviolet absorption and pulsed-laser damage in ion-beam-sputtered coatings based on HfO2/SiO2 thin-film pairs

Ristau, Detlev; Papernov, S.; Kozlov, A. A.; Oliver, J. B.; Smith, C.; Jensen, L.; Gunster, S.; Madebach, H.

doi:10.1117/12.2196654

The role of film interfaces in near-ultraviolet absorption and pulsed-laser damage in ion-beam-sputtered coatings based on HfO₂/SiO₂ thin-film pairs

Journal Article · Mon Nov 23 00:00:00 EST 2015 · Proceedings of SPIE - The International Society for Optical Engineering

DOI:https://doi.org/10.1117/12.2196654· OSTI ID:1264157

Ristau, Detlev ^[1]; Papernov, S. ^[2]; Kozlov, A. A. ^[2]; Oliver, J. B. ^[2]; Smith, C. ^[2]; Jensen, L. ^[3]; Gunster, S. ^[3]; Madebach, H. ^[3]

Univ. of Rochester, Rochester, NY (United States); Laser Zentrum Hannover e.V. (Germany); Laboratory for Laser Energetics, U. of Rochester
Univ. of Rochester, Rochester, NY (United States)
Univ. of Rochester, Rochester, NY (United States); Laser Zentrum Hannover e.V. (Germany)

The role of thin-film interfaces in the near-ultraviolet absorption and pulsed-laser–induced damage was studied for ion-beam–sputtered and electron-beam–evaporated coatings comprised from HfO₂ and SiO₂ thin-film pairs. To separate contributions from the bulk of the film and from interfacial areas, absorption and damage-threshold measurements were performed for a one-wave (355-nm wavelength) thick, HfO₂ single-layer film and for a film containing seven narrow HfO₂ layers separated by SiO₂ layers. The seven-layer film was designed to have a total optical thickness of HfO₂ layers, equal to one wave at 355 nm and an E-field peak and average intensity similar to a single-layer HfO₂ film. Absorption in both types of films was measured using laser calorimetry and photothermal heterodyne imaging. The results showed a small contribution to total absorption from thin-film interfaces, as compared to HfO₂ film material. The relevance of obtained absorption data to coating near-ultraviolet, nanosecond-pulse laser damage was verified by measuring the damage threshold and characterizing damage morphology. The results of this study revealed a higher damage resistance in the seven-layer coating as compared to the single-layer HfO₂ film in both sputtered and evaporated coatings. Here, the results are explained through the similarity of interfacial film structure with structure formed during the co-deposition of HfO₂ and SiO₂ materials.

Research Organization:: Univ. of Rochester, Rochester, NY (United States). Lab. for Laser Energetics

Sponsoring Organization:: USDOE

Grant/Contract Number:: NA0001944

OSTI ID:: 1264157

Journal Information:: Proceedings of SPIE - The International Society for Optical Engineering, Journal Name: Proceedings of SPIE - The International Society for Optical Engineering Vol. 9632; ISSN 0277-786X

Publisher:: SPIECopyright Statement

Country of Publication:: United States

Language:: English

References (7)

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Cited By (1)

The Optical Absorption and Photoluminescence Characteristics of Evaporated and IAD HfO2 Thin Films Kong, Mingdong; Li, Bincheng; Guo, Chun Coatings, Vol. 9, Issue 5 https://doi.org/10.3390/coatings9050307	journal	May 2019

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Related Subjects

36 MATERIALS SCIENCE
absorption
interfaces
laser damage
thin films