Comparison of femtosecond and nanosecond laser-induced damage in HfO{sub 2} single-layer film and HfO{sub 2}-SiO{sub 2} high reflector

Journal Article · Thu Mar 15 04:00:00 EDT 2007 · Journal of the Optical Society of America. Part B, Optical Physics

DOI:https://doi.org/10.1364/JOSAB.24.000538· OSTI ID:20929627

Lei, Yuan; Yuanan, Zhao; Guangqiang, Shang; Chengren, Wang; Hongbo, He; Jianda, Shao; Zhengxiu, Fan ^[1]

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1. Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800 (China) and Graduate School of the Chinese Academy of Sciences, Beijing 100039 (China)

HfO{sub 2} single layers, 800 nm high-reflective (HR) coating, and 1064 nm HR coating were prepared by electron-beam evaporation. The laser-induced damage thresholds (LIDTs) and damage morphologies of these samples were investigated with single-pulse femtosecond and nanosecond lasers. It is found that the LIDT of the HfO{sub 2} single layer is higher than the HfO{sub 2}-SiO{sub 2} HR coating in the femtosecond regime, while the situation is opposite in the nanosecond regime. Different damage mechanisms are applied to study this phenomenon. Damage morphologies of all samples due to different laser irradiations are displayed.

• OSTI ID: 20929627
• Journal Information: Journal of the Optical Society of America. Part B, Optical Physics, Journal Name: Journal of the Optical Society of America. Part B, Optical Physics Journal Issue: 3 Vol. 24; ISSN JOBPDE; ISSN 0740-3224
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
DAMAGE
ELECTRON BEAMS
EVAPORATION
HAFNIUM OXIDES
LASER RADIATION
LASERS
LAYERS
MORPHOLOGY
PULSES
SILICON OXIDES
THIN FILMS
VACUUM COATING