Thirty-centimeter-diameter ion milling source
Journal Article
·
· J. Vac. Sci. Technol.; (United States)
A 30 cm beam diameter ion source has been designed and fabricated for micromachining and sputtering applications. An argon ion current density of 1 mA/cm/sup 2/ at 500 eV ion energy was selected as a design operating condition. The completed ion source met the design criteria at this operating condition with a uniform and well-collimated beam having an average variation in current density of +- 5% over the center of 20 cm of the beam. This ion source has a multipole magnetic field that employs permanent magnets between permeable pole pieces. Langmuir probe surveys of the source plasma support the design concepts of a multipole field and a circumferential cathode to enhance plasma uniformity.
- Research Organization:
- Colorado State University, Fort Collins, Colorado 80523
- OSTI ID:
- 6930402
- Journal Information:
- J. Vac. Sci. Technol.; (United States), Journal Name: J. Vac. Sci. Technol.; (United States) Vol. 15:2; ISSN JVSTA
- Country of Publication:
- United States
- Language:
- English
Similar Records
Multipole implantation-isotope separation ion beam source
Ion source for the Juelich SNQ-project
Plasma studies on a hollow cathode, magnetic multipole ion source for neutral beam injection
Patent
·
Tue May 10 00:00:00 EDT 1983
·
OSTI ID:5960486
Ion source for the Juelich SNQ-project
Conference
·
Tue Oct 01 00:00:00 EDT 1985
· IEEE Trans. Nucl. Sci.; (United States)
·
OSTI ID:6298519
Plasma studies on a hollow cathode, magnetic multipole ion source for neutral beam injection
Journal Article
·
Tue Jun 01 00:00:00 EDT 1982
· Rev. Sci. Instrum.; (United States)
·
OSTI ID:5553555
Related Subjects
640301* -- Atomic
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ARGON IONS
BEAM OPTICS
CATHODES
CHARGED PARTICLES
CLOSED CONFIGURATIONS
CURRENT DENSITY
DESIGN
ELECTRIC DISCHARGES
ELECTRODES
ENERGY RANGE
EV RANGE
EV RANGE 100-1000
HOMOGENEOUS PLASMA
ION SOURCES
IONS
MACHINING
MAGNETIC FIELD CONFIGURATIONS
MAGNETIC FIELDS
MILLING
MULTIPOLAR CONFIGURATIONS
PERFORMANCE
PLASMA
PLASMA DENSITY
PLASMA DIAGNOSTICS
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ARGON IONS
BEAM OPTICS
CATHODES
CHARGED PARTICLES
CLOSED CONFIGURATIONS
CURRENT DENSITY
DESIGN
ELECTRIC DISCHARGES
ELECTRODES
ENERGY RANGE
EV RANGE
EV RANGE 100-1000
HOMOGENEOUS PLASMA
ION SOURCES
IONS
MACHINING
MAGNETIC FIELD CONFIGURATIONS
MAGNETIC FIELDS
MILLING
MULTIPOLAR CONFIGURATIONS
PERFORMANCE
PLASMA
PLASMA DENSITY
PLASMA DIAGNOSTICS