Properties of Y{sub 2}O{sub 3} nanocluster films deposited by Cu-vapor laser at room temperature

Journal Article · Mon Nov 01 04:00:00 EST 1999 · Journal of Vacuum Science and Technology, A

DOI:https://doi.org/10.1116/1.582072· OSTI ID:690706

Dinh, L N; Frischknecht, K D; Schildbach, M A; Anklam, T; McLean, W II ^[1]

---

1. Lawrence Livermore National Laboratory, Livermore, California 94550 (United States)

The dependence of stoichiometry, grain size, and surface morphology of yttrium oxide films, deposited by a Cu-vapor laser at room temperature, as a function of oxygen ambient pressure during synthesis were investigated. Auger electron spectroscopy showed that films with a O/Y ratio close to stoichiometry were obtained at oxygen pressures {gt}3{times}10{sup {minus}1} Torr. X-ray diffraction revealed that pulsed laser deposited yttrium oxide films were composed mainly of nanocrystals, the average grain size of which grew from about 9.3 to 22.1 nm as the oxygen pressure was increased from 1.5{times}10{sup {minus}2} to 5 Torr. The surface morphology of the films, as determined by secondary electron microscopy, also exhibited increasing roughness as the grain size increased. Films deposited in an oxygen background pressure up to 1.5{times}10{sup {minus}2} Torr were oxygen deficient but exhibited good adhesion to substrates, while those deposited at higher oxygen background were powdery. {copyright} {ital 1999 American Vacuum Society.}

• OSTI ID: 690706
• Journal Information: Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 6 Vol. 17; ISSN 0734-2101; ISSN JVTAD6
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ADHESION
AUGER ELECTRON SPECTROSCOPY
DEPOSITION
GRAIN SIZE
LASER RADIATION
OXYGEN
PRESSURE DEPENDENCE
SCANNING ELECTRON MICROSCOPY
STOICHIOMETRY
THIN FILMS
X-RAY DIFFRACTION
YTTRIUM COMPOUNDS
YTTRIUM OXIDES