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Pulsed laser deposition of high Tc superconducting thin films: Present and future

Conference ·
DOI:https://doi.org/10.1557/PROC-191-129· OSTI ID:6905836
Pulsed laser deposition (PLD) has been widely used for deposition of high {Tc} superconducting thin films, and has been approved as one of the best physical vapor techniques to prepare the films. The most important advantage of this technique is stoichiometric deposition, namely the films could be made with the same composition of the targets. Utilized PLD, not only thin films but also multilayers and superlattices of high {Tc} superconductors have been fabricated. In this paper, the performance of the technique will be reviewed, and the future will be speculated.
Research Organization:
Los Alamos National Lab., NM (USA)
Sponsoring Organization:
DOE/CE
DOE Contract Number:
W-7405-ENG-36
OSTI ID:
6905836
Report Number(s):
LA-UR-90-1526; CONF-900466--50; ON: DE90011950
Country of Publication:
United States
Language:
English