Synthesis of novel thin-film materials by pulsed laser deposition

Journal Article · Fri Aug 16 04:00:00 EDT 1996 · Science

DOI:https://doi.org/10.1126/science.273.5277.898· OSTI ID:387405

Lowndes, D H; Geohegan, D B; Rouleau, C M; Norton, D P ^[1]; Puretzky, A A ^[2]

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1. Oak Ridge National Laboratory, TN (United States)
2. Inst. of Spectroscopy, Troitsk (Russian Federation)

Pulsed laser deposition (PLD) is a conceptually and experimentally simple yet highly versatile tool for thin-film and multilayer research. Its advantages for the film growth of oxides and other chemically complex materials include stoichiometric transfer, growth from an energetic beam, reactive deposition, and inherent simplicity for the growth of multilayered structures. With the use of PLD, artificially layered materials and metastable phases have been created and their properties varied by control of the layer thicknesses. In situ monitoring techniques have provided information about the role of energetic species in the formation of ultrahard phases and in the doping of semiconductors. Cluster-assembled nanocrystalline and composite films offer opportunities to control and produce new combinations of properties with PLD. 46 refs., 4 figs.

• Sponsoring Organization: USDOE
• DOE Contract Number: AC05-96OR22464
• OSTI ID: 387405
• Journal Information: Science, Journal Name: Science Journal Issue: 5277 Vol. 273; ISSN SCIEAS; ISSN 0036-8075
• Country of Publication: United States
• Language: English

Related Subjects

40 CHEMISTRY
DEPOSITION
LASERS
THIN FILMS
USES