Sputtered thin film YBa sub 2 Cu sub 3 O sub n

Conference · Wed Feb 01 04:00:00 EST 1989 · AIP Conference Proceedings (American Institute of Physics); (USA)

OSTI ID:6905223

Kreider, K G ^[1]; Cline, J P; Shapiro, A ^[2]; Pena, J L; Rojas, A; Azamar, J A; Maldonado, L; Del Castillo, L ^[3]

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1. Center for Chemical Technology (USA)
2. Institute for Materials Science Gaithersburg, MD 20899 (USA) Engineering, National Institute of Standards and Technology, Gaithersburg, MD 20899 (USA)
3. CINVESTAV-IPN, U. Merida, A.P. 73 Cordemex, Yucatan 97310, Mexico (USA)

This study was carried out to determine the effect of substrate temperature, target to substrate angle, and the partial pressure of oxygen in the sputtering atmosphere on the stoichiometry of the deposition. Films were deposited by a planar magnetron sputtering of stoichiometric 1:2:3 pressed and sintered targets on MgO, ZrO{sub 2} (Y) and ZrO{sub 2} coated Al{sub 2}O{sub 3} substrates. EDX and WDS were used to determine the chemical composition of the thin films. X-ray diffraction was used to identify the structure after film crystallization at 1175 K and oxidation at 800 K. The partial pressure of oxygen appears to have the most profound effect on the stoichiometry by lowering the barium content. Negative ion resputtering of the growing film apparently also slows film growth rate. Films deposited on alumina circuitboard with a ZrO{sub 2} barrier layer have demonstrated sharp transitions to superconducting behavior at 95 K when the stoichiometric ratio is preserved.

• OSTI ID: 6905223
• Report Number(s): CONF-881035--
• Conference Information: Journal Name: AIP Conference Proceedings (American Institute of Physics); (USA) Journal Volume: 182:1
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
ALKALINE EARTH METAL COMPOUNDS
ANNEALING
BARIUM COMPOUNDS
BARIUM OXIDES
CHALCOGENIDES
CHEMICAL REACTIONS
COPPER COMPOUNDS
COPPER OXIDES
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
FABRICATION
FILMS
HEAT TREATMENTS
OXIDATION
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
PRESSURE MEASUREMENT
SAMPLE PREPARATION
SPUTTERING
SUPERCONDUCTIVITY
THERMODYNAMIC PROPERTIES
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
TRANSITION TEMPERATURE
VERY HIGH TEMPERATURE
YTTRIUM COMPOUNDS
YTTRIUM OXIDES