Theoretical evaluation of a short-pulse electron-beam-excited XeF( B r arrow X ) laser using a low-pressure, room-temperature Ar/Xe/F sub 2 gas mixture

Journal Article · Tue May 01 00:00:00 EDT 1990 · Journal of Applied Physics; (USA)

DOI:https://doi.org/10.1063/1.345001· OSTI ID:6900504

Nishida, N ^[1]; Takashima, T ^[2]; Tittel, F K ^[1]; Kannari, F; Obara, M ^[2]

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1. Department of Electrical Engineering Department of Computer Science, Rice University, Houston, Texas 77251 (USA)
2. Department of Electrical Engineering Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kouhoku-ku Yokohama 223 (Japan)

A simulation code for an electron-beam-excited XeF({ital B}{r arrow}{ital X}) laser using Ar/Xe/F{sub 2} gas mixtures is described. The validity of the code was checked by comparing the computed results to those obtained in a previously reported experiment with a 65-ns, 1.14-MW/cm{sup 3} excitation pulse. Good agreement is demonstrated for sidelight fluorescence, laser waveforms, output power, and energy. Furthermore, the simulation code analysis suggests that the XeF laser can be operated effectively with low-pressure ({lt}1 atm) Ar/Xe/F{sub 2} mixtures at room temperature. A maximum intrinsic efficiency of {similar to}3% is obtained at a total pressure of 0.5 atm. Such a low-pressure Ar/Xe/F{sub 2} laser gas mixture would permit operation of a scaled-up XeF laser system since the intrinsic efficiency is as high as that with conventional high-pressure ({similar to}3 atm) Ne/Xe/NF{sub 3} mixtures.

• OSTI ID: 6900504
• Journal Information: Journal of Applied Physics; (USA), Vol. 67:9; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
EXCIMER LASERS
ELECTRON BEAM PUMPING
ARGON
COMPUTERIZED SIMULATION
EFFICIENCY
FLUORINE
MIXTURES
XENON
XENON FLUORIDES
DISPERSIONS
ELECTRICAL PUMPING
ELEMENTS
FLUIDS
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
GASES
HALIDES
HALOGEN COMPOUNDS
HALOGENS
LASERS
NONMETALS
PUMPING
RARE GAS COMPOUNDS
RARE GASES
SIMULATION
XENON COMPOUNDS
426002* - Engineering- Lasers & Masers- (1990-)