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Scaling Characteristics of the XeF(C r arrow A) excimer laser

Journal Article · · IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (USA)
DOI:https://doi.org/10.1109/3.102636· OSTI ID:5771117
; ; ; ; ; ;  [1]; ;  [2]
  1. Department of Electrical and Computer Engineering, Rice University, Houston, TX (US)
  2. United Technologies Research Center, East Hartford, CT (USA)
The scaling characteristics and medium properties of an injection controlled XeF({ital C} {r arrow} {ital A}) laser pumped by a 10 ns high current density electron beam have been investigated. A five-component laser gas mixture consisting of F{sub 2}, NF{sub 3}, Xe, Kr, and Ar was optimized for the scaled laser conditions resulting in 0.8 J output pulses at 486.8 nm, corresponding to an energy density of 1.7 J/L and an intrinsic efficiency of 1.3%. Detailed small-signal-gain measurements combined with kinetic modeling permitted the characterization of the dependence of net gain on the electron beam energy deposition and gas mixture composition, resulting in an improved understanding of XeF({ital C} {r arrow} {ital A}) laser operation.
OSTI ID:
5771117
Journal Information:
IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (USA), Journal Name: IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (USA) Vol. 26:9; ISSN 0018-9197; ISSN IEJQA
Country of Publication:
United States
Language:
English