Pressure studies of ZrO/sub 2/-Al/sub 2/O/sub 3/ films grown by magnetron sputtering

Journal Article · Wed Dec 14 23:00:00 EST 1988 · Phys. Rev. B: Condens. Matter; (United States)

DOI:https://doi.org/10.1103/PhysRevB.38.13415· OSTI ID:6890079

Qadri, S B; Skelton, E F; Quinn, C; Gilmore, C

High-pressure studies have been performed on the free-standing films of ZrO/sub 2/-Al/sub 2/O/sub 3/ with (Zr):(Al) atomic ratio of 64:36 with use of energy-dispersive x-ray diffraction techniques and synchrotron radiation. As initially deposited in the magnetron sputtering system, the films are amorphous. The tetragonal phase which is stabilized upon annealing in air at 1000 /sup 0/C resembles the high-temperature tetragonal phase. This phase is more compressible than the high-pressure tetragonal phase and is stable up to 16.0 GPa. At room temperature, the amorphous films do not crystallize under application of pressures up to 25.0 GPa.

• Research Organization: Condensed Matter Physics Branch, Condensed Matter and Radiation Science Division, Naval Research Laboratory, Washington, D.C. 20375-5000
• OSTI ID: 6890079
• Journal Information: Phys. Rev. B: Condens. Matter; (United States), Journal Name: Phys. Rev. B: Condens. Matter; (United States) Vol. 38:18; ISSN PRBMD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360202* -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
BREMSSTRAHLUNG
CHALCOGENIDES
COHERENT SCATTERING
CRYSTALLIZATION
DIFFRACTION
ELECTROMAGNETIC RADIATION
ELECTRON TUBES
ELECTRONIC EQUIPMENT
EQUIPMENT
FILMS
MAGNETRONS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
OXIDES
OXYGEN COMPOUNDS
PHASE STABILITY
PHASE TRANSFORMATIONS
PRESSURE DEPENDENCE
RADIATIONS
SAMPLE PREPARATION
SCATTERING
SPUTTERING
STABILITY
STABILIZATION
SYNCHROTRON RADIATION
TRANSITION ELEMENT COMPOUNDS
VERY HIGH PRESSURE
X-RAY DIFFRACTION
ZIRCONIUM COMPOUNDS
ZIRCONIUM OXIDES