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Title: Phase formation and identification of an epitaxial Fe-Ni alloy silicide

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.342561· OSTI ID:6889003

Epitaxial iron-nickel alloy silicide has been successfully grown on (111) Si for the first time using a new method of chemically electroless plating of Fe-Ni thin films on Si with subsequent annealing schemes. The deposited film was found to be amorphous by analytical scanning transmission electron microscopy. The alloy silicide phase formed during two-step vacuum annealing and was found to have an epitaxial relationship with the substrate Si. The composition of the eptaxial alloy silicide was identified by an energy dispersive analysis for x rays in the electron microscope. A small amount of nickel was found in the alloy silicide. The crystal structure of the silicide phase was analyzed to be that of an orthorhombic phase of FeSi/sub 2/. The orientation relationships of the silicide phase with respect to the substrate were identified to be (033-bar) (Fe,Ni)Si/sub 2/parallel(022-bar) Si, (055) (Fe,Ni)Si/sub 2/parallel(4-bar22) Si, and (100) (Fe,Ni)Si/sub 2/parallel(111) Si. Typical arrays of regular interfacial dislocations of edge type, 1000 A in spacing, were found throughout the epitaxial regions. The formation and some potential applications of the epitaxial Fe-Ni alloy silicide are discussed.

Research Organization:
Department of Materials Science and Engineering, National Tsing-Hua University, Hsinchu, Taiwan, Republic of China
OSTI ID:
6889003
Journal Information:
J. Appl. Phys.; (United States), Vol. 65:1
Country of Publication:
United States
Language:
English