Formation of ferromagnetic interface between {beta}-FeSi{sub 2} and Si(111) substrate
- Graduate School of Materials Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192 (Japan)
Epitaxial {beta}-FeSi{sub 2} thin films were grown on Si(111)7x7 clean surfaces by solid phase epitaxy in ultrahigh vacuum: iron deposition at low temperature and subsequent annealing. We found that a ferromagnetic interface layer of iron-rich silicides forms between a {beta}-FeSi{sub 2} surface layer and a Si(111) substrate spontaneously from transmission electron microscopy observations and magnetization measurements.
- OSTI ID:
- 21016241
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 20 Vol. 91; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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