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U.S. Department of Energy
Office of Scientific and Technical Information

Aluminum arsenide eutectic gallium arsenide solar cell

Patent ·
OSTI ID:6882336

An improved gallium arsenide solar cell is provided by forming a P + layer on top of a wafer of plural vertical PN junction eutectic gallium arsenide crystal by liquid phase epitaxial growth of P doped GaAs followed by liquid phase epitaxial growth at Al/sub x/AsGa/sub l-x/ on the surface of the vertical PN junction substrate. The deposited GaAs layer with P dopant and the Al/sub x/AsGa/sub l-x/ layer forms horizontal P-N junctions with the N-type vertical regions. An N + region is formed on the solar cell backside by ion implantation of an N dopant followed by a pulse electron beam current of the implanted region.

Assignee:
Secretary of the Air Force
Patent Number(s):
US 4070205
OSTI ID:
6882336
Country of Publication:
United States
Language:
English