Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Drastic reduction of series resistance in doped semiconductor distributed Bragg reflectors for surface-emitting lasers

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.102869· OSTI ID:6875328
; ; ; ;  [1]
  1. AT T Bell Laboratories, Murray Hill, New Jersey 07974 (US)

Modifications to reduce the series resistance in {ital p}-type semiconductor distributed Bragg reflectors (DBR) consisting of ten pairs of quarter-wavelength GaAs (high refractive index)/Al{sub 0.7}Ga{sub 0.3}As (low index) layers were made by inserting an intermediate Al{sub 0.35}Ga{sub 0.65}As layer or a 200 A superlattice of GaAs(10 A)/Al{sub 0.7}Ga{sub 0.3}As (10 A) at the GaAs/Al{sub 0.7}Ga{sub 0.3}As heterointerfaces. The specific DBR series resistance was reduced by two orders of magnitude to about 6.2{times}10{sup {minus}5} {Omega} cm{sup 2}. These modifications did not alter the optical reflectivity and nearly identical reflection spectra were measured.

OSTI ID:
6875328
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 56:25; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English