Microstructure and properties of CVD tungsten carbide from tungsten hexafluoride and dimethyl ether

Journal Article · Thu Dec 01 04:00:00 EST 1994 · Materials Characterization; (United States)

DOI:https://doi.org/10.1016/1044-5803(94)90144-9· OSTI ID:6872264

Skaf, D W; Warner, A W; Dollahon, N R; Fargo, G H ^[1]

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1. Villanova Univ., PA (United States)

Tungsten carbide was deposited from tungsten hexafluoride, dimethyl ether, and hydrogen using a horizontal, cold-wall reactor. The effects of substrate temperature, reactor pressure, and reagent ratio on the coating growth rate, morphology, composition, and microhardness were studied. Under most conditions, the solid deposit was primarily W[sub 3]C with minor amounts of W. The tungsten carbide growth rate data fit an Arrhenius rate expression for temperatures from 425 to 550 C and had an activation energy of 24 kcal/mol at 70 mmHg total pressure and a WF[sub 6]/DME ratio of 6.3. A variety of surface morphologies and microstructures were observed. The microhardness of the coated substrates increased with coating thickness to a maximum value of 2,400 kg/mm[sup 2].

• OSTI ID: 6872264
• Journal Information: Materials Characterization; (United States), Journal Name: Materials Characterization; (United States) Vol. 33:4; ISSN 1044-5803; ISSN MACHEX
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201 -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360202* -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
360203 -- Ceramics
Cermets
& Refractories-- Mechanical Properties
CARBIDES
CARBON COMPOUNDS
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DEPOSITION
ETHERS
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
HARDNESS
MECHANICAL PROPERTIES
MICROHARDNESS
MICROSTRUCTURE
ORGANIC COMPOUNDS
ORGANIC OXYGEN COMPOUNDS
PARAMETRIC ANALYSIS
REFRACTORY METAL COMPOUNDS
SURFACE COATING
TRANSITION ELEMENT COMPOUNDS
TUNGSTEN CARBIDES
TUNGSTEN COMPOUNDS
TUNGSTEN FLUORIDES