Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Infrared Raman probing of deep-lying damaged layers in hydrogen-implanted GaAs

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.98241· OSTI ID:6870162
We report on the use of a cw Nd:yttrium aluminum garnet infrared laser to probe by Raman scattering the damaged layers of GaAs implanted with high-energy(--2 MeV) protons and deuterons. Such layers are too deep into the material to be probed by visible light. As the implanted area is approached laterally, we observe a gradual decrease in the scattering intensity of the longitudinal optical and transverse optical phonons and a downward shift of their frequencies. These effects are attributed to defect-induced absorption and lattice strains. The results demonstrate the advantages of the technique for studying the damage in deeply buried layers of radiation-modified materials.
Research Organization:
Max--Planck-Institut fuer Festkoerperforschung, Heisenbergstra US e 1, D-7000 Stuttgart 80, Federal Republic of Germany
OSTI ID:
6870162
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 50:5; ISSN APPLA
Country of Publication:
United States
Language:
English