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Nature of paramagnetic centers in a-Si and a-Si:H

Journal Article · · Phys. Rev. B: Condens. Matter; (United States)
A comparative ESR study has been undertaken of various kinds of a-Si and a-Si:H. Experiments on sputtered samples reveal that the local configuration of the usual dangling-bond (DB) centers (gapprox. =2.0055) depends on the details of deposition. The g value may gradually be reduced to values as low as 2.0041 as a result of local-structure change. Regarding the g = 2.004 signal originated from conduction-band-tail (CBT) states, it is shown that the effective correlation energy (U/sub eff/) is large and the temperature dependence of its spin density is due to the presence of donor levels: not due to a small-U/sub eff/ effect as has previously been concluded. Related to this, ample evidence is provided, indicating that the g = 2.004 signal in P-doped a-Si:H and the g = 2.005 DB line are in fact variants of the same kind of defect. Systematic analysis identifies the g = 2.004 CBT states signal with T/sub 3//sup -/-T/sub 3//sup +/+e/sup -/ defect centers thus showing that a great deal of the CBT states are defect states rather than disorder-induced localized states. Regarding the g = 2.013 signal in a-Si:H, evidence is provided showing that this cannot be associated with valence-band-tail states. Rather it concerns defects positioned at approx. =0.6 eV above the valence-band mobility edge, whose nature is as yet to be determined. Their presence relates directly or indirectly to H incorporation.
Research Organization:
Departement Natuurkunde, Katholieke Universiteit Leuven, B-3030 Leuven, Belgium
OSTI ID:
6865677
Journal Information:
Phys. Rev. B: Condens. Matter; (United States), Journal Name: Phys. Rev. B: Condens. Matter; (United States) Vol. 38:4; ISSN PRBMD
Country of Publication:
United States
Language:
English