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Title: Micromachined, reusable shadow mask for integrated optical elements grown by metalorganic chemical vapor deposition

Abstract

Precise three-dimensional control of micro-optical elements has recently been achieved using shadow masked metalorganic chemical vapor deposition (MOCVD) with an epitaxial mask. However, the epitaxial shadow mask used to deposit these precision micro-optics limits the size and shape of the available structures. In this work, a reusable shadow mask was fabricated by deep-Si reactive ion etching and employed in the growth of circular microlenses. This novel, reusable mask makes the shadow masked MOCVD process more rapid and less expensive and also allows more flexibility in the shape and size of the micro-optical elements that can be deposited. The micromachined shadow mask is held in place during growth by fusion bonding, it can be released by rapid cooling and it is easily cleaned for reuse. Microlenses with apertures as large as 500 {mu}m, fabricated under the micromachined mask, did not flatten at the center and formed accurate quadric surfaces.{copyright} {ital 1999 American Vacuum Society.}

Authors:
 [1];  [2]; ;  [1]; ;  [3];  [1]
  1. Center for High Technology Materials and the Electrical and Computer Engineering Department, University of New Mexico, Albuquerque, New Mexico 87106-4343 (United States)
  2. Center for High Technology Materials and the Electrical and Computer Engineering Department, University of New Mexico, Albuquerque, New Mexico 87106-4343 (United States)|[Sandia National Laboratories, Albuquerque, New Mexico 87185-0603 (United States)
  3. Sandia National Laboratories, Albuquerque, New Mexico 87185-0603 (United States)
Publication Date:
OSTI Identifier:
686530
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
Additional Journal Information:
Journal Volume: 17; Journal Issue: 5; Other Information: PBD: Sep 1999
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; RESPIRATORS; INTEGRATED CIRCUITS; OPTICS; MASKING; CHEMICAL VAPOR DEPOSITION; THIN FILMS; MACHINING; SILICON; ETCHING; MICROELECTRONICS

Citation Formats

Peake, G.M., Zhang, L., Li, N.Y., Sarangan, A.M., Willison, C.G., Shul, R.J., and Hersee, S.D. Micromachined, reusable shadow mask for integrated optical elements grown by metalorganic chemical vapor deposition. United States: N. p., 1999. Web. doi:10.1116/1.590874.
Peake, G.M., Zhang, L., Li, N.Y., Sarangan, A.M., Willison, C.G., Shul, R.J., & Hersee, S.D. Micromachined, reusable shadow mask for integrated optical elements grown by metalorganic chemical vapor deposition. United States. doi:10.1116/1.590874.
Peake, G.M., Zhang, L., Li, N.Y., Sarangan, A.M., Willison, C.G., Shul, R.J., and Hersee, S.D. Wed . "Micromachined, reusable shadow mask for integrated optical elements grown by metalorganic chemical vapor deposition". United States. doi:10.1116/1.590874.
@article{osti_686530,
title = {Micromachined, reusable shadow mask for integrated optical elements grown by metalorganic chemical vapor deposition},
author = {Peake, G.M. and Zhang, L. and Li, N.Y. and Sarangan, A.M. and Willison, C.G. and Shul, R.J. and Hersee, S.D.},
abstractNote = {Precise three-dimensional control of micro-optical elements has recently been achieved using shadow masked metalorganic chemical vapor deposition (MOCVD) with an epitaxial mask. However, the epitaxial shadow mask used to deposit these precision micro-optics limits the size and shape of the available structures. In this work, a reusable shadow mask was fabricated by deep-Si reactive ion etching and employed in the growth of circular microlenses. This novel, reusable mask makes the shadow masked MOCVD process more rapid and less expensive and also allows more flexibility in the shape and size of the micro-optical elements that can be deposited. The micromachined shadow mask is held in place during growth by fusion bonding, it can be released by rapid cooling and it is easily cleaned for reuse. Microlenses with apertures as large as 500 {mu}m, fabricated under the micromachined mask, did not flatten at the center and formed accurate quadric surfaces.{copyright} {ital 1999 American Vacuum Society.}},
doi = {10.1116/1.590874},
journal = {Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena},
number = 5,
volume = 17,
place = {United States},
year = {1999},
month = {9}
}