Properties of films prepared from low surface area/density alumina-silica

Conference · Sun Dec 31 23:00:00 EST 1989

DOI:https://doi.org/10.1557/PROC-180-433· OSTI ID:6861621

Hietala, S L; Smith, D M ^[1]; Hietala, V M; Frye, G C; Hurd, A J; Brinker, C J ^[2]

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1. New Mexico Univ., Albuquerque, NM (USA)
2. Sandia National Labs., Albuquerque, NM (USA)

A sol-gel method was use to prepare bulk, closed pore, amorphous alumina-silica. Films prepared from this 47wt% Al{sub 2}O{sub 3}- SiO{sub 2} composition were examined by SAW, elipsometry and electrical measurements. The films were found to have a surface area of 1.1 cm{sup 2}/cm{sup 2}, a refractive index of 1.44 at 633 nm, and a relative permittivity of 6.2 at 200 KHz. These properties indicate potential applications as hermetic seals, barrier coatings, dielectric layers for capacitors and passivation coatings for electronic circuits.

• Research Organization: Sandia National Labs., Albuquerque, NM (USA)
• Sponsoring Organization: DOE/DP
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 6861621
• Report Number(s): SAND-90-1111C; CONF-900466--36; ON: DE90011048
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201 -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
CHALCOGENIDES
DENSITY
DIELECTRIC PROPERTIES
ELECTRICAL PROPERTIES
FILMS
OPTICAL PROPERTIES
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
POROSITY
REFRACTIVITY
SILICON COMPOUNDS
SILICON OXIDES
SOL-GEL PROCESS
SURFACE AREA
SURFACE PROPERTIES
THIN FILMS